Microstructures Formation by Fluorocarbon Barrel Plasma Etching
نویسندگان
چکیده
منابع مشابه
Monitoring Plasma Over-etching of Wafer-bonded Microstructures
Personal use of this material is permitted. However, permission to reprint/republish this material for advertising or promotional purposes or for creating new collective works for resale or redistribution to servers or lists, or to reuse any copyrighted component of this work must be obtained from the Foundation for Sensor and SUMMARY We have demonstrated that wafer-level probing of electrostat...
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Plasma-surface interactions during plasma etching are important in that, in addition to determining the rate and quality of the etch, they can also influence the properties of the bulk plasma. To address this coupling of bulk and surface processes the surface kinetics model ~SKM! was developed as a module in the two-dimensional hybrid plasma equipment model ~HPEM! with the goal of combining pla...
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s of the 44th National Symposium of the American Vacuum Society, San Jose, CA, 20–24 Oct. 1997, p. 215. S.-J. Wang, I.-S. Jin, and H.-H. Park, Surf. Coat. Technol. 100–101, 59 ~1998!. M. Schaepkens, N. R. Rueger, J. J. Beulens, X. Li, T. E. F. M. Standaert, P. J. Matsuo, and G. S. Oehrlein, J. Vac. Sci. Technol. A 17, 3272 ~1999!. H.-H. Park, M.-H. Jo, H.-R. Kim, and S.-H. Hyon, J. Mater. Sci. ...
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ژورنال
عنوان ژورنال: International Journal of Plasma Science and Engineering
سال: 2008
ISSN: 1687-6245,1687-6253
DOI: 10.1155/2008/371812